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准确的测量薄膜的厚度和光学常数,在薄膜的制备、研究和应用中都是十分重要的。借助Cauchy色散模型,通过薄膜透过率测量曲线,用改进的自适应模拟退火遗传算法对透过率曲线进行全光谱拟合,从而反演得到薄膜的厚度和光学常数。对由电子束蒸发制备的TiO2单层膜和SiO2/TiO2双层膜的厚度和光学常数进行了测量计算。实验结果表明,计算得到的光学参数与实测结果相一致,厚度误差小于2nm,在560nm波长处折射率误差小于0.03。
Accurate measurement of film thickness and optical constants, in the film preparation, research and application are very important. By means of the Cauchy dispersion model, the full-spectrum of the transmittance curve was fitted with a modified adaptive simulated annealing genetic algorithm through the film transmittance measurement curve, and the thickness and optical constants of the film were inversely obtained. The thickness and optical constants of TiO2 monolayer and SiO2 / TiO2 bilayer films prepared by electron beam evaporation were measured and calculated. The experimental results show that the calculated optical parameters are consistent with the measured results, the thickness error is less than 2 nm, and the error of the refractive index at the wavelength of 560 nm is less than 0.03.