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Modelling and optimization of f ilm thickness variation for plasma enhanced chemical vapour depositi
[期刊论文] 作者：XiuhuaFu,LinLi,GibsonDes,WaddellEwan,WingoLv,
来源：ChineseOpticsLetters 年份：2013
This letter describes a method for modelling film thickness variation across the deposition area within plasma enhanced chemical vapour deposition (PECVD) processes. The model enables identification and optimization of film thickness unifor......
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