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Comparative Study of Plasma-Enhanced Atomic Layer Deposition Ni by using Two Metallorganic Precursor
[会议论文] 作者：Jaehong Yoon,Woo-Hee Kim,Jungku Song,Hyungjun Kim,
来源：2011年第三届微电子及等离子体技术国际会议 年份：2011
Nickel thin films were deposited by plasma-enhanced atomic layer deposition (PE-ALD) by using metallorganic precursors and various reactant gases,H2 and NH3,inc...
Comparative Study of Plasma-Enhanced Atomic Layer Deposition Ni by using Two Metallorganic Precursor
[会议论文] 作者：Jaehong Yoon,Woo-Hee Kim,Jungku Song,Hyungjun Kim,
来源：2011年第三届微电子及等离子体技术国际会议 年份：2011
Nickel thin films were deposited by plasma-enhanced atomic layer deposition (PE-ALD) by using metallorganic precursors and various reactant gases,H2 and NH3,including its plasma....
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