A high etch rate GaAs via-hole process was studied in an inductively coupled plasma system using Cl2/BCl3 gas system. Th......

基于电路二端口网络理论，建立了过孔电学特性等效电路模型，给出了模型参数的提取过程。在分析比较物理模型和经验模型两种不同的模型......