磁控管溅射相关论文
许多研究所制取BSCCO(B Sr Ca Cu氧化物)薄膜已获成功。日本富士通公司宣称用卤化物化学气相沉积法制成了BSCCO单晶薄膜。薄膜沉......
四年前,高温超导体首次发现以后,大量的高温超导材料相继问世。然而,其中仅有一种特殊类型的材料即薄膜超导体接近于现实应用。因......
一种用于极紫外（EUV）光刻系统的高反射率反射镜已成为各国科学家研究的热点。虽然钼／硅（Mo／Si）或钼／铍（Mo／Be）多层膜堆层反射镜在１２nm波长处产......
两项重要的技术突破代表了溅射工作的发展。这就是:(1)在六十年代后期高频溅射方法的有效发展,似乎极大地扩展了新溅射的导电及非......
一、前言物理气相沉积法(即PVD法)最早是在1972年NASA主办的阴极溅射和离子涂覆会议上首先提出的,通过1973年六月日本钢铁协会主......
自1987年初发现液氮温度下呈现超导特性的Ba_2 YCu_3O_7-δ陶瓷以来,陶瓷超导体的研究已成为物理学者、陶瓷材料学者所关注的中心......
以TiNi为基的形状记忆合金是最常用的合金,主要是由于有高的功能输出和优良的抗腐蚀性能。从1990年以来,发现形状记忆薄膜可作为......
脉冲等离子在溅射方面的应用在过去的几年里日渐盛行。最近 ,一种新的脉冲等离子技术已被引入到溅射领域。高能脉冲磁控管溅射(HPP......
溅射方法是指将各种蒸发材料(如磁性材料、电阻材料等)加工成靶,用氩等离子体轰击,使待蒸发材料溅射到基板、衬片等表面上形成薄......
日本电电公社武藏野电气通信研究所在9月份举行的1982年秋季第43届应用物理学会学术会议上声称:由底层抗蚀剂-中间层-顶层抗蚀剂......
国外已有一些厂家试图用钼钨等的硅化物栅来取代 MOS LSI 的硅栅。该栅电极的电阻率比硅栅低一个数量级以上,可以使用同硅栅 MOS L......
在将Nb型超导材料研制成超导元件之后,日本电信电话公用公司电讯研究试验室用磁控管溅射法研制临界温度Tc高达21.4～22.2°C,电特性......
我们在室温和600℃下用复合的二硅化钛靶在〈111〉向的裸硅片上溅射淀积了二硅化铁膜。室温下淀积的二硅化钛膜需要在900℃下进行......
据报道,日本京都大学开发了一种使超声波、光及电子元件集成在同一个基片上的一体化元件。该元件可瞬时检测及控制通过硅基片上的......
就工业涂镀系统ＨＴＣ－１０００－ＭＫＩ而言，组合的电弧／不平衡磁控管（ＡＢＳ＾ＴＭ）的ＰＶＤ硬涂层技术用于硬涂布市场已有五年了，除了有改进的ＨＴＣ－１０００－ＡＢＳ－ＭＫⅡ型外，目前使用的是ＨＴＣ－１５００－ＡＢＳ，其生产能力是原......
脉冲等离子在溅射方面的应用在过去的几年里日渐盛行.最近,一种新的脉冲等离子技术已被引入到溅射领域.高能脉冲磁控管溅射(HPPMS)......
A nanocrystalline coating of Cu-20Zr (in wt pct) was obtained on glass by magnetron sputtering. The corrosion behavior o......
Effects of Power Density and Post Annealing Process on the Microstructure and Wettability of TiO2 Fi
“ TiO2 电影的准备 parameters-microstructures-wettability ”的关系是 reported.In 这个工作， TiO2 电影被使用中间频率的双磁......
Local segregation in Cu-In precursors and its effects on microstructures of selenized CuInSe2 thin f
Local segregation in Cu-In precursors and its effects on the element distribution and microstructures of selenized CuInS......
Silicon carbonitride (SiCN) coatings were deposited on silicon and tungsten carbide substrates by co-sputtering silicon ......
Applications of Cr-Based Metal Nitride Hard Coatings Using Multi-Magnetron Sputtering Sources and El
Cr-based nitride hard coatings were produced by multi-magnetron sputtering sources using elemental metal materials. Cr, ......
Amorphous carbon nitride thin films were prepared by plasma-enhanced DC magnetron sputtering using twinned microwave ele......
A novel co-sputtering method that combined magnetron sputtering (MS) with ion beam sputtering (IBS) was used to fabricat......
CoPt thin films with various Cu contents varying from 0 vol.% to 21.5 vol.% were deposited on glass substrates by magnet......
We have deposited W/Si multilayer mirrors using the magnetron sputtering under the low sputtering pressure and the high......
[埃及土人 _(1.5nm )/ZrO_(2 x nm )]_(10 ) 多层的电影被磁控管劈啪作响在玻璃底层上扔然后为 30 min 在 600 ℃在真空退火了。他......
应用Co的溅射原理,以磁控管溅射低温沉积法在轴承钢Gr15(20mm×5mm)基体上分别制备了B4C-Mo和TiC-W金属陶瓷涂层.然后测量了......
The oxidation and hot corrosion behavior of Co-Ni-Cr-Al-Ta-Y coating produced by magnetron sputtering with and without e......
Ar Pressure Dependence of the Properties of Molybdenum-doped ZnO Films Grown by RF Magnetron Sputter
有高透明性和相对低的抵抗力的做铝的氧化锌(MZO ) 的透明进行氧化物电影被 RF (收音机频率) 准备磁控管在房间温度劈啪作响。在不......
MoS2/Ti composite coatings (MoSTM), have been deposited by a closed-field unbalanced magnetron sputter ion-plating syste......
The Study of Deposition Parameters, Properties for PVD TixN and CrxN Coatings Using a Closed Field U
Closed Field Unbalanced Magnetron Sputter Ion Plating (CFUBMSIP) systems have been used increasingly for PVD coating in ......
A 3 kW radio frequency (RF) magnetron-sputtering unit was used to produce zirconia ceramic coatings on hollow turbine bl......
