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Plasma large-area etching technology requires inductively coupled plasma (ICP) reactors to work with a uniform plasma density.A two-dimensional (2D) self-consistent fluid model has been employed to investigate the influence of the RF bias power on the plasma radial uniformity in a hydrogen discharge with a fixed pressure,i.e.,10 mTorr.The ICP power is fixed at 13.56 MHz and 17 A.