Non-oxide ceramic microstructures with excellent tolerance to high temperatures,corrosion resistance,and tribological properties have great potential in microfluidic devices.In this work,we reported UV sensitive preceramic polymer for micro-ceramic structuring.Highly photosensitive polyvinylsilazane as an inorganic polymer photoresist was synthesized by a chemical modification for SiN-based ceramic microstructuring applications.The chemical structural changes and linkage reaction mechanism (Fig.1) were examined by FT-IR,GPC,1H-and 13C-NMR analysis.The heatflow was increased from 0.7w/g to 9.1w/g (Fig.2).Furthermore,the as-synthesized m-PVSZ was used to fabricate line patterns and a three-layered octagon structures by a two-photon absorption stereolithography process(Fig.3).It is plausible that complex ceramic microstructures for tribologic MEMS or microfluidics can be constructed in a facile technical manner using the novel polymer photoresist.