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Study of Passivation Mechanism of Thermal ALD Al2O3 Films on Silicon with Different Annealing Temper
【机 构】
:
Laboratory of Solar Cell Technology,Institute of Electrical Engineering,Chinese Academy of Sciences,
【出 处】
:
第一届国际ALD应用大会暨第二届中国ALD学术交流会
【发表日期】
:
2012年4期
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