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  5. A study on the characteristics of nitrogen doped thiophene plasma polymer by PECVD with controlled n

A study on the characteristics of nitrogen doped thiophene plasma polymer by PECVD with controlled n

来源 :2011年第三届微电子及等离子体技术国际会议 | 被引量 : 0次 | 上传用户：mkms2080
【摘 要】
：
The nitrogen doped thiophene plasma polymer (ThioPP) was deposited on silicon(100) substrate by plasma enhanced chemical vapor deposition (PECVD) method as a function of nitrogen flow rate.
【作 者】
：
Sang-Jin Cho Chunyan Jin Jin-hyo Boo 
【机 构】
：
Department of Chemistry and Institute of Basic Science, Sungkyunkwan University, Suwon 440-746, Kore
【出 处】
：
2011年第三届微电子及等离子体技术国际会议
【发表日期】
：
2011年9期
【关键词】
：
Plasma Polymer Electrical properties PECVD 
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The nitrogen doped thiophene plasma polymer (ThioPP) was deposited on silicon(100) substrate by plasma enhanced chemical vapor deposition (PECVD) method as a function of nitrogen flow rate.
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