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XPS analysis and Energy-band Alignment of Annealed Al2O3 Films Prepared by Atomic Layer Deposition o
【作 者】
：
【机 构】
：
Material Science Center,Institute of Semiconductors,Chinese Academy of Sciences,Beijing 100083,P.R.C
【出 处】
：
第一届国际ALD应用大会暨第二届中国ALD学术交流会
【发表日期】
：
2012年4期
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