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5. Determination of Plasma Parameters in a Dual-frequency Capacitively Coupled Plasma using Optical Emi

Determination of Plasma Parameters in a Dual-frequency Capacitively Coupled Plasma using Optical Emi

来源 :2011年第三届微电子及等离子体技术国际会议 | 被引量 : 0次 | 上传用户：hlxcun871

【摘 要】

：

In plasma processings,dual-frequency capacitively coupled plasma (DF-CCP) is widely used because of it allows the generation and control of medium to high plasma densities with reasonably independent

【作 者】

：

Wen-Yao Liu Yong Xu Yong-Quan Du 

【机 构】

：

Laboratory of Plasma Physical Chemistry, Dalian University of Technology, Dalian, People's Republic

【出 处】

：

2011年第三届微电子及等离子体技术国际会议

【发表日期】

：

2011年9期

【关键词】

：

DF-CCP gas temperature electron temperature fluorine atom concentration 

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In plasma processings,dual-frequency capacitively coupled plasma (DF-CCP) is widely used because of it allows the generation and control of medium to high plasma densities with reasonably independent control of the mean energy of positive ions striking the substrate.

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