一、离子注入技术的发展概况及特点离子注入是在高真空下以一定的能量将离子注入材料表面,用以改变材料性质的一种技术。六十年代,离子注入广泛用于半导体材料的掺杂及半导体元件的制作。到了七十年代,人们将离子注入用于金属材料表面改性,使其得到了新的发展。十多年来,国外 First, the development and characteristics of ion implantation technology Ion implantation is under high vacuum with a certain amount of energy ions into the material surface, to change the nature of a material technology. Sixties, ion implantation is widely used for doping semiconductor materials and semiconductor devices. In the seventies, people used ion implantation for the surface modification of metal materials, making it get a new development. More than 10 years abroad