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采用射频磁控溅射制备不同Mo含量的TiMoN薄膜.利用XRD,SEM.EDS,纳米压痕仪和高温摩擦磨损实验对薄膜的相结构,形貌,成分,力学性能和摩擦磨损性能进行分析.结果表明,TiMoN薄膜为fcc结构;当Mo占金属元素总量的比例X<68.37%(原子分数)时,薄膜主要为Mo在TiN中的置换固溶体;当X>68.37%时.薄膜主要为Ti在Mo_2N中的置换固溶体;随Mo含量的增高.择优取向发生改变,晶粒尺寸逐渐减小,薄膜的显微硬度显著升高,最高达36.37 GPa,摩擦系数逐渐降低,并在X达到68.37%后稳定在0.4左右;不同Mo含量的TiMoN薄膜的磨损率在10~(-8)- 10~(-6)mm~2/N之间.优于TiN薄膜.基于晶体化学理论,对TiMoN薄膜低摩擦系数的原因进行了讨论.
TiMoN films with different Mo content were prepared by RF magnetron sputtering.The phase structure, morphology, composition, mechanical properties and friction and wear properties of the films were analyzed by XRD, SEM.EDS, nanoindentation and high temperature friction and wear tests. The results show that the TiMoN thin film is fcc structure. When the ratio of Mo to the total metal element X is less than 68.37% (atom fraction), the film is mainly the substitutional solid solution of Mo in TiN. When X> 68.37% The substitutional solid solution in Mo_2N increases with the increase of Mo content. The preferred orientation changes and the grain size decreases gradually. The microhardness of the film increases significantly to 36.37 GPa and the friction coefficient decreases gradually. When the X reaches 68.37% And then stabilized at about 0.4. The wear rate of TiMoN films with different Mo content was between 10 -8 -8 -6 mm 2 / N, which was better than that of TiN films.Based on the crystal chemistry theory, the TiMoN films The reason for the low coefficient of friction is discussed.