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用双离子束溅射淀积法,在轰击源含不同 CH_4流量比的条件下,于玻璃和 Si 基片上淀积了DLC 薄膜。用多种手段对所制备的膜进行了结构表征和性能分析。结果表明,轰击源中 CH_4流量比对DLC 膜的结构、形貌及其光、电性能有重要的影响。分析了影响机制,探讨了 DLC 膜的生长机理。
DLC thin films were deposited on glass and Si substrates by double ion beam sputtering deposition at bombardment sources with different CH 4 flow rates. The prepared membranes were characterized and characterized by various means. The results show that the CH 4 flow ratio in the bombardment source has an important influence on the structure, morphology and optical and electrical properties of DLC films. The influence mechanism was analyzed, and the growth mechanism of DLC film was discussed.