本文阐述了四极溅射装置的基本结构、放电特性和溅射速率。同时也报导了该装置淀积的钽、二氧化硅和氧化铝膜的电气和物理化学特性的实验结果。溅射装置的电极是由一个热灯丝阴极、一个阳极、一个靶极和一个能在低于1× 10-3乇氩气压强下起燃放电的点火电极组成的。磁场的作用 This paper describes the basic structure of the quadrupole sputtering device, discharge characteristics and sputtering rate. The experimental results of the electrical and physico-chemical properties of tantalum, silicon dioxide and aluminum oxide films deposited on the device are also reported. The electrode of the sputtering apparatus consisted of a hot filament cathode, an anode, a target and an ignition electrode capable of igniting discharge at a pressure of less than 1 x 10-3 Torr argon. The role of magnetic field