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用化学溶液法在P-S i(100)衬底上制备出了一系列不同退火温度的B i3.25La0.75Ti3O12(BLT)铁电薄膜。通过X-射线衍射、扫描电镜及椭偏光谱测量研究,得到了一系列BLT薄膜结晶状况、表面形貌及光学常数谱。其结果显示:BLT薄膜表面均匀、致密,没有裂纹;随着退火温度的升高BLT薄膜晶化越来越好,当退火温度为690℃时,BLT基本完全晶化;非晶态的BLT薄膜折射率明显低于晶态BLT薄膜的折射率,随着BLT薄膜退火温度的增加,薄膜折射率n增大且其消光系数k也略有增加。
A series of B i3.25La0.75Ti3O12 (BLT) ferroelectric thin films with different annealing temperatures were prepared on P-Si (100) substrates by chemical solution method. By X-ray diffraction, scanning electron microscopy and ellipsometry measurement, a series of BLT film crystallization conditions, surface morphology and optical constant spectra were obtained. The results show that the surface of BLT thin film is uniform and compact without cracks. The BLT thin film is crystallized better with the increase of annealing temperature. When the annealing temperature is 690 ℃, BLT is almost completely crystallized. The amorphous BLT thin film The refractive index is obviously lower than that of the crystalline BLT film. With the increase of the annealing temperature of the BLT film, the refractive index n of the film increases and its extinction coefficient k increases slightly.