在不同温度衬底上射频磁控溅射沉积ZrO2－12wt％Y2O3薄膜进行了不同方式的退火后处理。其一为1000℃大气气氛下的热退火处理，其二为高真空渗氧条件下的电子束退火处理。退火前后的相结构和显微形貌的研究表明，退火前的沉积膜相组成与沉积过程中衬底温度有关，退火后的沉积膜相组成与退火方式有关，其形貌特征经不同形式退火显示出明显的差别。 Different kinds of annealing treatments were carried out on the films of ZrO2-12wt% Y2O3 deposited by RF magnetron sputtering on different temperature substrates. One is thermal annealing at 1000 ° C in the atmosphere and the other is electron beam annealing at high vacuum. The phase structure and microstructure before and after annealing show that the phase composition of the deposited film before annealing is related to the substrate temperature during the deposition. The phase composition of the deposited film after annealing is related to the annealing method. The morphology of the deposited film is annealed by different forms Shows a clear difference.