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Mitsubishi瓦斯化学公司和Mitsubishi化学公司在美国建合资公司,生产半导体清洗液用超纯过氧化氢(H2O2)。该合资公司定名为MGC纯化学品美洲公司,投资约2000万美元。目前
Mitsubishi Gas Chemical Company and Mitsubishi Chemical Company established a joint venture in the United States to produce ultra-pure hydrogen peroxide (H2O2) for semiconductor cleaning solutions. The joint venture named MGC Pure Chemicals Americas, with an investment of approximately US$20 million. Currently