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采用射频反应溅射制备了纳米晶WO3薄膜。基于Berg理论建立了WO3射频反应溅射模型,并分析工艺参数对滞回曲线的影响,基于研究了抽速、基片温度、馈入功率、靶片间距和溅射靶等离子体溅射面积的影响。提出了一种新的消除滞回曲线的制备纳米晶WO3薄膜的方法和优化的工艺参数。论文制备了性能良好的电致变色纳米晶WO3薄膜。分别用环境扫描电镜(ESEM)、X射线光电子能谱(XPS),X射线衍射(XRD)和分光光度计测试了该薄膜,该薄膜在可见光波段,不变色时的透光率大于95%,变色后为65%。纳米晶WO3薄膜的晶粒尺寸在40纳米左右,其高比表面积和缺陷态为电致变色的例子扩散提供了通道。
Nanocrystalline WO3 thin films were prepared by RF reactive sputtering. Based on the Berg theory, a WO3 radio frequency reactive sputtering model was established and the influence of process parameters on the hysteresis curve was analyzed. Based on the study of the pumping speed, the substrate temperature, the feeding power, the distance between the target and the sputter area influences. A new method for preparing nanocrystalline WO3 thin films with optimized hysteresis curves and optimized process parameters were proposed. The paper prepared a good performance electrochromic nanocrystalline WO3 film. The films were tested by using environmental scanning electron microscopy (ESEM), X-ray photoelectron spectroscopy (XPS), X-ray diffraction (XRD) and spectrophotometer. The transmittance of the film in the visible light band was> 95% After discoloration is 65%. Nanocrystalline WO3 films have a grain size of about 40 nanometers, and their high specific surface area and defect state provide channels for the diffusion of electrochromic examples.