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早在1938年,美国就研制成功了多层减反膜,稍后在欧洲也取得了成功。减反膜在光学薄膜生产中处于非常重要的地位:照像物镜、眼镜片、望远镜、显微镜、测距仪等,几乎所有的光学仪器都采用了减反膜。目前减反膜的制备在技术上已经成熟,尤其是借助电子计算机,多层减反膜的膜系也变得十分完美。减反膜在制备方法上先后采用了电阻加热蒸发和电子枪蒸发法等。然而随着大批量减反膜的需求,提出了在室温下,大面积沉积减反膜的要求。由于磁控溅射能得到性能很稳定的光学薄膜,而且在室温下能进行大面积沉积,因此近年来受到广泛重视。本文介绍采用磁控溅射沉积多层宽带减反膜,研究了溅射系统、厚度监控、沉积
As early as 1938, the United States successfully developed a multi-layer antireflective film and later succeeded in Europe. Anti-reflection film in the optical film production is in a very important position: photographic objectives, ophthalmic lenses, telescopes, microscopes, range finders, almost all of the optical instruments are used antireflection film. At present, the preparation of anti-reflection film has been technically mature, especially with the help of electronic computer, the anti-reflection film of multi-layer film system has become very perfect. Anti-reflection film in the preparation method has used a resistance heating evaporation and electron gun evaporation and so on. However, with the demand for high-quality antireflective films, a large area deposition antireflective film is proposed at room temperature. Since magnetron sputtering can obtain a very stable optical film and can deposit large area at room temperature, it has received extensive attention in recent years. This article describes the use of magnetron sputtering deposited multilayer broadband antireflection film, the sputtering system, thickness monitoring, deposition