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选取多个钨丝均匀的分布在一个圆周上,形成一个环状蒸发源。把每个钨丝看成一个标准的点蒸发源,与LAMOST子镜建立模型形成一个蒸发沉积系统。把镜面离散成一个致密的具有特定坐标点的阵列,把每个点蒸发源对镜面上特定点的膜层厚度的贡献相加,从而得出膜层厚度的采样值。文章分析了点源的个数、圆环的半径、源基距、以及蒸发源的发射特性对膜层均匀性的影响,最终确定选取了12个钨丝,把源基距定为0.8m,把圆环半径定为0.55m。设计了相应的挡板实现了膜层不均匀性低于5%的要求。
Select a number of tungsten evenly distributed in a circle, forming a circular evaporation source. Think of each tungsten as a standard point evaporation source and model it with the LAMOST mirror to create an evaporative deposition system. Dispersing the mirror into a dense array of points of particular coordinates adds the contribution of each point evaporation source to the film thickness at a particular point on the mirror surface to arrive at a sample of film thickness. In this paper, the influence of the number of point sources, the radius of the ring, the distance between the source and the source and the emission characteristics of the evaporation source on the uniformity of the film were analyzed. Finally, 12 tungsten wires were selected, Set the radius of the circle as 0.55m. The corresponding baffle is designed to meet the requirement of less than 5% of film nonuniformity.