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针对无掩模光刻技术制作微柱透镜阵列的面形精度问题,对曝光方式和掩模设计进行研究,采用一种分模曝光方法,包括图形分层,掩模设计,分层掩模灰度调制,分层曝光四个步骤。在曝光前,需要对二维掩模版图按设计结构高度进行分层,以实现单层掩模在抗蚀剂上的投影成像高度不超过物镜的焦深范围。基于数字微镜阵列对灰度掩模的空间调制原理,设计出匹配的分层掩模版图,给出了图形分层原则和方法以及模板设计的原理。实验结果表明:采用该方法制作微柱透镜阵列,面形平均误差为0.54μm,相比以往单模曝光平均误差值0.79μm,平均误差减小了0.25μm,该方法弥补了由物镜焦深限制所造成的技术问题,提高了曝光质量。
Aiming at the problem of surface shape accuracy of micro-cylindrical lens array fabricated by maskless lithography, the exposure mode and mask design are researched. A parting exposure method is adopted, which includes pattern layering, mask design, Degree modulation, hierarchical exposure four steps. Before exposure, the two-dimensional mask layout needs to be layered at the designed structural height so that the projection height of the monolayer mask on the resist does not exceed the focal depth range of the objective lens. Based on the spatial modulation principle of digital micromirror array for gray mask, a matching layered mask layout is designed. The principle and method of graphic layering and the principle of template design are given. The experimental results show that the average error of the surface shape is 0.54μm. Compared with the average single-mode exposure error of 0.79μm, the average error is reduced by 0.25μm. This method makes up for the limitation of the focal depth of the objective lens Caused by the technical problems, improve the quality of exposure.