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Nanogranular Ti(3 nm)/Ni(30 nm)/Ti(t nm )(t=1,3,5,7,10) films were prepared by facing magnetron sputtering from Ti and Ni onto glass substrates at room temperature.The structural and magnetic properties of films strongly depended on the Ti layer thickness.X-ray diffraction(XRD) patterns of all as-deposited films showed strong FCC Ni(111) peak.Vibrating sample magnetometer(VSM) measurements indicated that the perpendicular coercivity of the Ti(3 nm)/Ni(30 nm)/Ti(3 nm) film reached about 36 kA/m.With the increase of Co layer thickness,coercivity(Hc) first increased and then decreased.The grain size and magnetic clusters slightly increased and the value of roughness(Ra) was smallest at t=3 nm.
Nanogranular Ti (3 nm) / Ni (30 nm) / Ti (t nm) (t = 1,3,5,7,10) films were prepared by facing magnetron sputtering from Ti and Ni onto glass substrates at room temperature. structural and magnetic properties of films strongly depended on the Ti layer thickness. X-ray diffraction (XRD) patterns of all as-deposited films showed strong FCC Ni (111) peak. Vibrating sample magnetometer (VSM) measurements indicated that the perpendicular coercivity of the Ti (3 nm) / Ni (30 nm) / Ti (3 nm) film reached about 36 kA / m .With the increase of Co layer thickness, coercivity (Hc) first increased and then decreased.The grain size and magnetic clusters slightly increased and the value of roughness (Ra) was smallest at t = 3 nm.