以钛酸丁酯和无水乙醇分别为前驱体和溶剂 ,添加适量稳定剂制成稳定溶胶 ,用浸涂法在 Al2 O3基片上制备 Ti O2 薄膜 ,经在 10 0 0℃氢气氛下还原制得 Ti O2 - x薄膜 .通过 SEM照片发现薄膜颗粒在几十纳米左右 ,颗粒分布均匀 .由 XRD分析 ,薄膜的 x值在 0～ 0 .5之间 .实验结果表明 ,Ti O2 - x薄膜在 80 0℃下具有良好的氧敏感性和响应特性 ,薄膜在 N2 条件下具有很好的电阻 -温度特性 Titanium tetrabutoxide and anhydrous ethanol were used as precursors and solvents, respectively, and proper amount of stabilizer was added to prepare a stable sol. Ti 2 O 2 films were prepared on Al 2 O 3 substrates by dip coating. The films were reduced in a hydrogen atmosphere at 100 ℃ The results show that the x - value of Ti02 - x film is between 0 and 0.5 by XRD.The experimental results show that the Ti O2 - x film has the best particle size distribution 80 0 ℃ with good oxygen sensitivity and response characteristics of the film in the N2 conditions have good resistance - temperature characteristics