【摘 要】
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We prepare HfO2 thin films by electron beam evaporation technology. The samples are annealed in air after deposition. With increasing annealing temperature, it
【机 构】
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R&D Center for Optical Thin Film Coatings, Shanghai Institute of Optics and Fine Mechanics, Chinese
论文部分内容阅读
We prepare HfO2 thin films by electron beam evaporation technology. The samples are annealed in air after deposition. With increasing annealing temperature, it is found that the absorption of the samples decreases firstly and then increases. Also, the laser-induced damage threshold (LIDT) increases firstly and then decreases.When annealing temperature is 473 K, the sample has the highest LID T of 2.17J / cm2, and the lowest absorption of 18ppm. By investigating the optical and structural characteristics and their relations to LIDT, it is shown that the principal factor dominating the LIDT is absorption.
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