采用显微硬度测试方法,研究在单晶硅衬底上沉积厚度仅为0.09-0.56μm的磁控溅射类金刚石碳膜的力学性能。结果表明,溅射碳膜的硬度随溅射工艺参数呈规律性变化,且可以和碳膜的类金刚石性质以及碳膜结构的SP~3和SP~2成分的变化相联系。采用Johnson复合硬度模型进行的分析表明,溅射碳膜的真实硬度在HV6000-6600之间,比天然金刚石的硬度略低。溅射类金刚石碳膜具有明显的压痕尺寸效应(ISE),其指数约为m=1.9。 The microhardness test method was used to study the mechanical properties of magnetron sputtered diamond-like carbon films with a thickness of only 0.09-0.56μm on a monocrystalline silicon substrate. The results show that the hardness of the sputtered carbon film changes regularly with the sputtering process parameters, and it can be related to the diamond - like carbon film and the changes of the SP 3 and SP 2 components of the carbon film. Analysis using the Johnson composite hardness model shows that the true hardness of the sputtered carbon film is between HV6000 and 6600, slightly lower than that of natural diamond. Sputtered diamond-like carbon films have a significant indentation size effect (ISE) with an index of about m = 1.9.