重离子加速器(串列加速器除外)、离子注入机和其它各种利用离子束进行表面分析的装置中,如果采用多电荷离子源,则可成倍地提高可供利用的离子的能量范围,这对充分发挥装置的潜力,实现装置的小型化有重要意义。 我们利用原有的双等离子体离子源,改成双等-PIG源,在离子源实验台上做了几种气体离子的引束试验,获得的初步结果如下: In heavy ion accelerators (with the exception of tandem accelerators), ion implanters, and other devices that use ion beam for surface analysis, the energy range of available ions can be exponentially increased if multiple ion sources are used To give full play to the potential of the device to achieve the miniaturization of the device is of great significance. We use the original dual plasma ion source, into a dual-PIG source, ion source in the experimental bench made several gas ion beam test, the preliminary results obtained are as follows: