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按照逻辑器件发展的节点顺序,依次论述了各种光学邻近效应修正技术:基于经验的光学邻近效应修正、基于模型的光学邻近效应修正、曝光辅助图形、光源和掩模版的优化、反演光刻技术以及两次曝光技术等。概括了各种技术出现的逻辑技术节点、数据处理流程、修正的表现形式和效果、优势和发展前景等。最后就先导光刻工艺的研发模式(先建立光学和光刻胶模型,再进行“计算光刻”),论证了光刻工艺的研发必须和光学邻近效应修正的数据流程实现互动的观点,即任何光刻工艺参数的变动都会影响到“计算光刻”模型的准确性,需要重新进行修正,以避免原计算可能导致的失败。因此,光学邻近效应修正是先导光刻工艺研发的核心。
According to the order of node development of logic devices, various optical proximity effect correction techniques are discussed successively: experience-based optical proximity correction, model-based optical proximity correction, exposure aided graphics, optimization of light source and reticle, Technology and double exposure technology. Summarize the various logical technology nodes, data processing flow, the modified forms and effects, advantages and prospects of development. Finally, the development of photolithography lithography process model (the first to establish the optical and photoresist models, and then calculate the lithography ), demonstrate the development of photolithography process must be and optical proximity effect data flow to achieve an interactive view , That is, any change of lithography process parameters will affect the accuracy of the “Calculate Lithography” model and need to be revised again to avoid the possible failure caused by the original calculation. Therefore, optical proximity correction is at the heart of the development of leading photolithography processes.