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采用直流辉光放电等离子体增强化学气相沉积(PECVD)技术方法 ,在Si(100)衬底上制备了金刚石薄膜 ,并在此基础上合成了含有少量晶态颗粒的非晶氮化碳薄膜
A diamond film was prepared on a Si (100) substrate by direct current glow discharge plasma enhanced chemical vapor deposition (PECVD) technique. On the basis of this, an amorphous carbonitride film containing a small amount of crystalline particles was synthesized