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本文采用静电自组装技术在表面阳离子化的SiO2粒子(SiO2-CBAFS)上构筑了高分子刷,并采用核磁、红外、热失重、接触角和原子力显微镜分别表征了组装粉体的结构、组装量以及自组装单层膜的组装行为和表面拓扑形貌。研究结果表明,采用静电自组装技术可以成功地在SiO2-CBAFS上构筑组装量高达27%的高分子刷,远远高于国际上已见报道的采用共价键合法构筑的高分子刷的组装量(20%)。研究发现,组装量随聚合物(PS-NH-SO3Na)分子量呈非线性增长,其组装行为受到PS-NH-SO3Na的分子量和溶液浓度的影响。
In this paper, polymer brushing was fabricated on the surface of cationized SiO2 particles (SiO2-CBAFS) by electrostatic self-assembly technique. The structure, assembly and assembly of the assembled powders were characterized by NMR, IR and AFM respectively. As well as the assembly behavior and surface topography of the self-assembled monolayer. The results show that the use of electrostatic self-assembly technology can be successfully assembled in SiO2-CBAFS up to 27% of the polymer brush, much higher than the internationally reported covalent bonding method to build polymer brush assembly Amount (20%). The results show that the molecular weight of PS-NH-SO3Na increases linearly with the molecular weight of PS-NH-SO3Na, and its assembly behavior is affected by the molecular weight and concentration of PS-NH-SO3Na.