利用直流辉光放电等离子体辅助的脉冲激光沉积技术在Si衬底上生长了碳氮薄膜 .通过扫描电子显微镜、X射线衍射、X射线光电子能谱、俄歇电子能谱等多种手段 ,对薄膜的形貌、成分、晶体结构、价键状态等特性进行了分析和确定 .结果表明 ,沉积薄膜为含有非晶SiN和晶态氮化碳颗粒结构 ,晶态成分呈多晶态 ,主要为α C3N4 相、β C3N4 相 ,晶粒大小为 4 0— 60nm .碳氮之间主要以C N非极性共价键形式相结合 . The carbon-nitrogen thin films were grown on Si substrates by DC glow discharge plasma-assisted pulsed laser deposition.According to scanning electron microscopy, X-ray diffraction, X-ray photoelectron spectroscopy and Auger electron spectroscopy, The morphology, composition, crystal structure and valence state of the films were analyzed and confirmed.The results showed that the deposited films were composed of amorphous SiN and crystalline carbon nitride and the crystalline components were polycrystalline, mainly α C3N4 phase and β C3N4 phase with a grain size of 40-60nm.The carbon and nitrogen are mainly combined with CN nonpolar covalent bond.