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用磁控溅射法在奥氏体不锈钢基片上制备了SiC单层膜和Ti/TiN双层膜以及Ti/TiN/SiC功能梯度薄膜。采用XRD和显微硬度计对薄膜的结晶质量和硬度进行表征;用AFM和SEM对薄膜的表面和截面形貌进行了表征。结果表明:Ti/TiN双层膜在氩氮流量比为15∶15时,薄膜的结晶质量最好,硬度最高,达到15.6 GPa,最适合作为钢基SiC薄膜的缓冲层。另外,功能梯度SiC薄膜比SiC单层膜的结晶质量好;不同退火温度下功能梯度SiC薄膜的硬度高于SiC单层膜,同时功能梯度SiC薄膜的表面结晶质量也优于SiC单层膜。
SiC monolayer and Ti / TiN bilayer and Ti / TiN / SiC functional gradient films were prepared on austenitic stainless steel substrates by magnetron sputtering. The crystal quality and hardness of the films were characterized by XRD and microhardness tester. The surface and cross-sectional morphology of the films were characterized by AFM and SEM. The results show that the film has the best crystal quality and the highest hardness reaches 15.6 GPa when the argon / nitrogen flow ratio is 15:15, which is the best for the buffer layer of SiC-based SiC films. In addition, the functional graded SiC film has better crystallinity than the SiC monolayer film; the hardness of the functional graded SiC film is higher than that of the SiC monolayer film at different annealing temperatures, and the surface crystalline quality of the functional graded SiC film is better than that of the SiC monolayer film.