论文部分内容阅读
利用直流溅射仪制备了纳米金薄膜,并通过随后的退火处理得到了纳米金颗粒,研究了不同衬底、溅射时间、退火温度及时间对纳米金颗粒形成的影响规律。结果表明,衬底对纳米金的形成有显著的影响,形核质点多的载玻片比单晶硅片更容易形成细小的纳米金颗粒;溅射时间越短,退火温度愈高,纳米金薄膜愈容易球化;在溅射30 s、400℃保温60 min的条件下得到了直径为8～12 nm的金颗粒。根据金的表面能、表面张力以及金原子的扩散等因素讨论了纳米金颗粒的形成机制。
Gold nanostructured thin films were prepared by direct current sputtering and gold nanoparticles were obtained by subsequent annealing. The effects of different substrates, sputtering time, annealing temperature and time on the formation of gold nanoparticles were investigated. The results show that the substrate has a significant effect on the formation of nano-gold. Slides with more nucleation sites are more likely to form fine nano-gold particles than the single-crystal Si wafer. The shorter the sputtering time, the higher the annealing temperature, The more easily the film is nodular, the diameter of 8 ~ 12 nm gold particles are obtained under the condition of sputtering for 30 s and holding at 400 ℃ for 60 min. According to the surface energy of gold, surface tension and the diffusion of gold atoms and other factors discussed the formation of gold nanoparticles mechanism.