【摘 要】
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A novel photosensitive prepolymer of trimethylolpropane triglycidylether triacrylate was synthesized by utilizing trimethylolpropane triglycidylether and acryli
【机 构】
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State Key Laboratory of Plastic Forming Simulation and Die & Mould Technology,School of Material Sci
论文部分内容阅读
A novel photosensitive prepolymer of trimethylolpropane triglycidylether triacrylate was synthesized by utilizing trimethylolpropane triglycidylether and acrylic acid as two starting materials, triphenyl phosphine as catalyst and p-hydroxyanisole as inhibitor. The optimum synthesis conditions were that the concentration of triphenyl phosphine was 0.85wt% of reactants, the concentration of p-hydroxyanisole was 0.3wt% of reactants, and the reaction temperature was at 90-110 ℃. Benzil dimethyl ketal of a UV-cured initiator was added to the synthesized trimethylolpropane triglycidylether triacrylate to prepare a kind of UV-cured coating. The mechanical properties of the UV-cured films were determined, giving 28.43 MPa of tensile strength, 965.59MPa of Young’s modulus and 4.10% of elongation at tear.
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