利用双探针测得了管式射频等离子体反应器内电子密度的轴向和角向分布,并制得了SnO_2透明导电薄膜.实验表明,薄膜的沉积速率、电学性能及结晶形态受等离子体电子密度的影响较大.在电子密度高的地方,薄膜沉积速率快,薄膜电阻低,其薄膜的晶粒也均匀细微密集. The axial and angular distributions of the electron density in the tube RF plasma reactor were measured by dual probes, and the SnO_2 transparent conductive films were prepared.The experimental results show that the deposition rate, electrical properties and crystalline morphology of the films are affected by the plasma electron density In the high electron density area, the film deposition rate is fast, the film resistance is low, the film is also fine and dense grains.