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介绍了Ｘ光激光薄膜锗靶的制备工艺，在厚度为９０ｎｍ的ｆｏｒｍｖａｒ膜上，采用磁控溅射技术沉积３０～６０ｎｍ厚的锗膜．对锗膜的应力进行了初步的测试与分析，制得的薄膜经干涉仪测量符合要求。
The preparation technology of X-ray laser film germanium target is introduced. On the formvar film with the thickness of 90nm, the 30-60nm germanium film is deposited by magnetron sputtering technology. The stress of germanium film has been preliminarily tested and analyzed. The obtained film was measured by the interferometer to meet the requirements.