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为阐明水稻高表达玉米C4型磷酸烯醇式丙酮酸羧化酶基因(C4phosphoenolpyruvate carboxylase,C4pepc)出现高光效的分子机理,以盆栽转C4pepc水稻(PC)及野生型Kitaake(WT)为材料,花后7d茎吸入脱落酸(abscisic acid,ABA)、正丁醇(n-butanol,BA)及氯化二亚苯基碘(diphenyleneiodonium,DPI),考察其对叶片光合特性及酶活性等影响。结果表明:(1)与ABA处理不同,DPI和BA处理下PC的Pn均呈现先增加后下降的趋势,BA处理0.5h时Pn明显增加,原因主要是由于气孔导度的增加;(2)ABA、BA和DPI对Fv/Fm的影响不明显,与WT相比,PC的qP下降少;(3)BA处理后PC的PEPC活性降低了26%,而DPI处理则增加了48%。各处理并未对PEPC蛋白和基因的表达有影响。
In order to elucidate the molecular mechanism of high photoperiod of C4phosphoenolpyruvate carboxylase (C4pepc) highly expressed in rice, pot-transgenic C4pepc rice (PC) and wild-type Kitaake (WT) After 7 days, abscisic acid (ABA), n-butanol (BA) and diphenyleneiodonium (DPI) were inbred to investigate their effects on photosynthetic characteristics and enzyme activity. The results showed that: (1) Different from ABA treatment, the Pn of PC increased firstly and then decreased with the treatment of DPI and BA. The Pn of BA increased 0.5h, which was mainly due to the increase of stomatal conductance. (2) The effect of ABA, BA and DPI on Fv / Fm was not obvious. Compared with WT, the qP of PC decreased less. (3) The PEPC activity of PC decreased by 26% and that of DPI increased by 48%. Each treatment did not affect the expression of PEPC protein and gene.