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以CF4,CH4和N2为源气体,利用射频等离子体增强化学气相沉积法,在不同功率下制备了含氮氟化类金刚石膜.用俄歇电子能谱、拉曼光谱、X射线光电子能谱和傅里叶变换红外光谱对薄膜的电子结构和化学键进行了表征,并结合高斯分峰拟合方法分析了薄膜中sp2,sp3结构比率.结果表明,制备的薄膜属于类金刚石结构,不同沉积功率下,薄膜内的sp2/sp3值在2.0—9.0之间,随着沉积功率的增加薄膜内sp2的相对含量增加.膜内主要有C—Fx(x=1,2),C—C,CC和CN等化学键.沉积功率增加,C—C基团增加,膜内F的浓度降低,C—F基团减少,薄膜的关联加强,稳定性提高.
The nitrogen-containing fluorinated diamond films were prepared at different powers by RF plasma-enhanced chemical vapor deposition using CF4, CH4 and N2 as the source gases. Auger electron spectroscopy, Raman spectroscopy, X-ray photoelectron spectroscopy And Fourier transform infrared spectroscopy (FTIR) were used to characterize the electronic structures and chemical bonds of the films, and the sp2 and sp3 structure ratios were analyzed by means of Gaussian peak fitting method.The results show that the films are diamond-like structures with different deposition powers , The sp2 / sp3 in the film is between 2.0 and 9.0, and the relative content of sp2 in the film increases with deposition power.The main C-Fx (x = 1,2), C-C, CC And CN, etc. The deposition power increases, the C-C group increases, the concentration of F in the film decreases, the C-F group decreases, the association of the film increases, and the stability improves.