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引入Taguchi方法分析并优化一种带外延层的PPD结构(EPPD),并通过SILVACO软件进行验证。实验结果显示该方法通过对EPPD像素结构工艺参数的优化,提升了该结构抑制噪声的能力和光电转换性能。
The Taguchi method was introduced to analyze and optimize a PPD structure (EPPD) with epitaxial layers and validated by SILVACO software. Experimental results show that this method improves the ability of the structure to suppress noise and improve the photoelectric conversion performance by optimizing the process parameters of the EPPD pixel structure.