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Structural and Electrical Properties of the Low-k SiOC(-H) Film Prepared with Plasma-Enhanced Atomic
[会议论文] 作者：Navamathavan,Chi Kyu Choi,
来源：2011年第三届微电子及等离子体技术国际会议 年份：2011
SiOC(-H) thin films with low-dielectric-constant have been prepared by using plasma-enhanced atomic layer deposition.I-V and C-V characteristics of the SiOC(-H) films were measured for the meatal-insu...
Growth and Characterization of Nanocrystalline/Nanocolumnar Aluminum Thin Films on Ti/glass Substrat
[会议论文] 作者：S K Sharma,Bo-Gyun Kim,Chi Kyu Choi,
来源：2011年第三届微电子及等离子体技术国际会议 年份：2011
Ever growing demand for lighter,cheaper and safer Li-ion batteries with high energy density that can power electric vehicles and portable electronics stimulates researchers to discover new anode mater...
Effects of the UV Treated SiCN Capping Layer on the SiOC(-H) Film Prepared by Plasma-Enhanced Atomic
[会议论文] 作者：Navamathavan,Chi Kyu Choi,
来源：2011年第三届微电子及等离子体技术国际会议 年份：2011
Multilevel interconnection structures comprising of low-k films with inlaid copper wires in a dual damascene process have been identified as the new generation technology in the National Technology Ro...
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