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[会议论文] 作者：Wenwen Lei,Xingcun Li,Qiang Chen,
来源：2011年第三届微电子及等离子体技术国际会议 年份：2011
Atomic layer deposition is used in applications where inorganic or organic materials layers with uniform thickness down to the nanometer range are required....
Investigation of Electron Cyclotron Resonance Plasma-assisted Atomic Layer Deposition Al2O3 Thin Fil
[会议论文] 作者：Lijun Sang,Qiang Chen,Xingcun Li,Lizhen Yang,
来源：The 8th Asian-European International Conference on Plasma Su 年份：2011
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Investigation of Electron Cyclotron Resonance Plasma-assisted Atomic Layer Deposition Al2O3 Thin Fil
[会议论文] 作者：Lijun Sang,Qiang Chen,Xingcun Li,Lizhen Yang,
来源：The 8th Asian-European International Conference on Plasma Su 年份：2011
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[期刊论文] 作者：Haiying WEI,Hongge GUO,Lijun SANG,Xingcun LI,Qiang CHEN,
来源：黑龙江科技信息 年份：2018
本文通过对荣华二采区10...
The Study of in-Situ Growth Mechanism of Magnetized Plasma-Assisted Atomic Layer Deposition of Al2O3
[会议论文] 作者：Xingcun Li,Wenwen Lei,Qiao Zhao,Zhenduo Wang,Qiang Chen,
来源：2011年第三届微电子及等离子体技术国际会议 年份：2011
Growth mechanism during plasma-assisted atomic layer deposition (PA-ALD) of Al2O3 thin film was studied by in-situ spectroscopic ellipsometry.Herein the trimethylaluminum (TMA) and O2 were used as the...
Investigation of electron cyclotron resonance plasma-assisted atomic layer deposition Al2O3 thin fil
[会议论文] 作者：Lijun Sang,Qiang Chen,Xingcun Li,Lizhen Yang,Zhongwei Liu,
来源：2011年第三届微电子及等离子体技术国际会议 年份：2011
Without extra-heating,Al2O3 thin films were deposited on hydrogen-terminated Si substrate etched in hydrofluoric acid by a home-made electron cyclotron resonance (ECR) plasma-assisted atomic layer dep...
Influence of Magnetic Field on the Reaction Mechanisms of Plasma-Assisted Atomic Layer Deposition of
[会议论文] 作者：Xingcun Li,Wenwen Lei,Qiao Zhao,Zhenduo Wang,Qiang Chen,
来源：The 8th Asian-European International Conference on Plasma Su 年份：2011
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