【摘 要】
：
The TiO2 thin films were coated uniformly on the glass beads by a plasma chemical vapor deposition (PCVD) reactor.The TiO2–coated glass beads were applied to r
【机 构】
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DepartmentofChemicalEngineeringDepartmentofAdvancedMaterialsScienceandEngineeringKangwonNationalUniv
【出 处】
：
等离子体催化与能源材料应用研讨会(ISPCEM2012)
论文部分内容阅读
The TiO2 thin films were coated uniformly on the glass beads by a plasma chemical vapor deposition (PCVD) reactor.The TiO2–coated glass beads were applied to remove NO and SO2 in a dielectric barrier discharge- photocatalyst hybrid (DBD-PH) process.The thickness of TiO2 thin films on glass beads was controlled precisely by changing the deposition time in PCVD process.The glass beads coated with TiO2 thin films are packed in the glass tube,where the non-thermal plasma discharge is generated by applying high voltage power to the cylinder-wire type DBD-PH reactor.
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