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5. A comparison study on reactive ion etched silicon wafers with and without silver nano-particle masks

A comparison study on reactive ion etched silicon wafers with and without silver nano-particle masks

来源 :2011年第三届微电子及等离子体技术国际会议 | 被引量 : 0次 | 上传用户：xjy_1666

【摘 要】

：

In this work,multicrystalline silicon (mc-Si) wafers were surface textured by SF6/O2 reactive ion etching (RIE).Such technique was known as the maskless etching,and usually,the etched silicon surface

【作 者】

：

Xiaodong Su Yanming Bi Shuai Zou Yu Xin Jie Huang 

【机 构】

：

Jiangsu Key Laboratory of Thin Films, Department of Physics, Soochow University, Suzhou 215006, P.R.

【出 处】

：

2011年第三届微电子及等离子体技术国际会议

【发表日期】

：

2011年9期

【关键词】

：

Textured silicon wafer Plasma etching sliver nana-particle solar cell 

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In this work,multicrystalline silicon (mc-Si) wafers were surface textured by SF6/O2 reactive ion etching (RIE).Such technique was known as the maskless etching,and usually,the etched silicon surface is covered by columnar microstructures,which maybe undesired for the trapping light into the solar cells.

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