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The synthesis of nc-Si/a-SiNx: H quantum dot thin films using RF/UHF high density PECVD plasmas
【机 构】
:
NU-SKKU Joint Institute for Plasma Nano Materials (IPNM), Center for Advanced Plasma Surface Technol
【出 处】
:
13th Asia-Pacific Conference on Plasma Science and Technolog
【发表日期】
:
2016年10期
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