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5. Comparison between the characteristics of single and multiple inductively coupled plasma source

Comparison between the characteristics of single and multiple inductively coupled plasma source

来源 :13th Asia-Pacific Conference on Plasma Science and Technolog | 被引量 : 0次 | 上传用户：sunmoon

【摘 要】

：

Many studies have been investigated on high density plasma source (Electron Cyclotron Resonance[ECR],Inductively Coupled Plasma[ICP],Helicon plasma) for large area source after It is announced that pr

【作 者】

：

Jinwon Lee B.K.Na Hong Young Chang 

【机 构】

：

KAIST, 291 Daehak-ro Yuseong-gu Daejeon, Republic of Korea

【出 处】

：

13th Asia-Pacific Conference on Plasma Science and Technolog

【发表日期】

：

2016年10期

【关键词】

：

ICP Multiple sources coupling efficiency uniformity 

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　　Many studies have been investigated on high density plasma source (Electron Cyclotron Resonance[ECR],Inductively Coupled Plasma[ICP],Helicon plasma) for large area source after It is announced that productivity of plasma process depends on plasma density.Among them,Some researchers have been studied on multiple sources.

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