This study examined the synthesis of large area graphene and the change of its characteristics depending on the ratio of CH4/H2 by using the thermal CVD methods and performed the experiments to contro
Radio frequency plasma enhanced chemical vapor deposition (RF-PECVD) technique is widely used in preparing uniform and large area a-Si:H films for various photoelectric devices.
AZO (ZnO∶Al) polycrystalline thin films are fabricated by plasma enhanced chemical vapor deposition (PECVD) method on silicon (100) substrates,followed by annealing in oxygen ambient from 400℃ to 900℃
Impurities play a central role in semiconductor technology.As semiconductor devices move towards nano-scale dimensions,doping of semiconductor nanocrystals continues to gain interest as a research top
Hydrogenated microcrystalline silicon thin films (μc-Si∶H) were deposited by remote inductive coupled plasma (ICP) assistant pulsed dc twin magnetron sputtering at a temperature below 300℃.
In this report,eco-friendly nickel (Ni) electroplating is carried out on plastic substrate using chemically modified graphene sheets.Graphene oxide (GO) solution is deposited on PET film and slowly ev
In this article,a high-performance InP/InGaAs metamorphic δ-doped heterojunction bipolar transistor (HBT) grown on low-cost GaAs substrate by solid-source MBE is first experimentally demonstrated.
Carbon-fiber microelectrodes (CFMEs) have been a useful tool for micro devices because of their small size,strength,and good electrochemical properties.In this study,a conventional carbon fiber was de
In recent years,direct printing methods such as ink-jet,gravure,offset and screen printing have intensively studied because it is very simple and could reduce the amount of waste of raw materials in c
Cu-based interconnects continue to be used in ultra large integrated circuits (ULSI) due to its low resistivity and improved electromigration (EM) resistance.