• 不 限
  • 期刊论文
  • 硕博论文
  • 会议论文
  • 报 纸
  • 英文论文
  2. 您的位置
  3. 首页
  4. 会议论文
  5. Discharge Formation Mechanisms of Nano-Second High-Pressure Hydrogen Discharges

Discharge Formation Mechanisms of Nano-Second High-Pressure Hydrogen Discharges

来源 :2011年第三届微电子及等离子体技术国际会议 | 被引量 : 0次 | 上传用户：gj1019
【摘 要】
：
Dynamic processes of capacitively-coupled hydrogen plasmas generated by fast-rising pulsed high voltages at near-atmospheric pressure have been studied with the use of Particle-in-Cell (PIC) simulatio
【作 者】
：
Chieh-Wen Lo Satoshi Hamaguchi 
【机 构】
：
Department of Physics, National Cheng Kung University, Tainan, Taiwan, Republic of China;Center for
【出 处】
：
2011年第三届微电子及等离子体技术国际会议
【发表日期】
：
2011年9期
【关键词】
：
Atmospheric Pressure Discharge Particle-in-Cell Simulation Hydrogen Discharge 
下载到本地 , 更方便阅读
下载此文 赞助VIP
声明 : 本文档内容版权归属内容提供方 , 如果您对本文有版权争议 , 可与客服联系进行内容授权或下架
论文部分内容阅读
Dynamic processes of capacitively-coupled hydrogen plasmas generated by fast-rising pulsed high voltages at near-atmospheric pressure have been studied with the use of Particle-in-Cell (PIC) simulations.
其他文献
Dependence of the formation of GaAs/Si on the orientation of Si substrate
The heteroepitaxy of GaAs on Si substrates is great interest because of its applicability to monolithic integrated optoelectronic devices,such as in optoelectronic integrated circuits,quantum effect d
会议
Si substrateGaAsSolar cellOrientation
Impact of the conditions on the electrostatic oscillations in unbalanced magnetron sputtering plasma
Unbalanced magnetron sputtering technique has been extensively used in the area of material sputtering and deposition.The magnetron sputter discharge produces complicated electrostatic oscillations in
会议
Mode Transition in Inductive Discharges and the Interaction of the Capacitive and Inductive Coupling
It is well known that inductively coupled plasmas have two excitation mechanisms,capacitive (E) mode and inductive (H) mode.
会议
Mode transitionRF substrate biasCapacitive and inductive couplings
Fluid simulation of phase-shift effect in hydrogen capacitively coupled plasmas
A two-dimensional self-consistent fluid model coupled with the full set of Maxwell equations is established to investigate the phase shift effect on transient behaviors of electrodynamics and power de
会议
Capacitively-coupled plasmaPhase-shift effectElectromagnetic effects
Collisionless bounce resonance heating in dual-frequency capacitively coupled plasmas
We present the very first experimental evidence of the so-called collisionless electron bounce-resonance-heating (BRH) in low pressure dual-frequency (DF) capacitively coupled plasmas (CCPs).
会议
Dual-frequency Capacitively Coupled PlasmaCollisionless Bounce Resonance heatin
Studies on the Spatial and Temporal Behaviors of the Electron Energy Distribution and Plasma Paramet
Spatial and temporal behaviors of the electron energy distributions (EEDFs) and the plasma parameters were experimentally studied in inductively coupled plasma (ICP) and/or capacitively coupled plasma
会议
inductively coupled plasmacapacitively coupled plasmaelectron energy distribut
An analysis of E×B drift movement in the SH4 plasmas included negatively charged nanoparticles
The negatively charged nanoparticles are generated for prepare the silicon thin films in the SH4 plasma.It has been recognized that the nanoparticles contamination is a major problem in plasma process
会议
silicon nanoparticlesnegatively charged ionE×B drift
Time- and Space-Resolved Characteristics of Ozone Concentration in Atmospheric Pressure Plasma using
Atmospheric pressure plasmas have been given much attention because of its cost performance and various possibilities for industrial applications.In general,atmospheric plasmas are maintained by the s
会议
Atmospheric Pressure PlasmaUltra Short PulseOzoneSpatial Profile
Numerical Calculation of Spatial Electric Field by RF Bias in High Density Plasmas
In this study,numerical calculation of the spatial electric field induced by biased electrode of 13.56 MHz was performed in high density plasmas.
会议
numerical calculationhigh density plasmasspatial electric fieldskin effect
Development of a large RF plasma source for dust removal
To remove the dust particles about 100 cm long within the vacuum chamber,we have developed a large rectangular plasma device with size of 120(L) x 50(W) x 44(H) cm^3.
会议
Dust removalRF antennaelectric curtain