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由美国真空学会、美国电机及电子学工程师联合会电子器件学组和电化学学会联合主办的1983年国际电子束、离子束和光子束讨论会于5月31日至6月3日在美国加利福尼亚州洛杉矶举行。在本届全体会议上,宣读了分子级制造技术和分子电子器件、激光直接书写工艺和用聚焦离子束实现毫微米结构的无掩模蚀刻等三篇报告。在随后举行的分组会议上,共
The 1983 International Electron Beam, Ion Beam and Photon Beam Symposium, co-sponsored by the American Institute of Vacuum, the American Society of Electro-Mechanical and Electronic Engineers and the Electrochemistry Society, will be held May 31-June 3 in California, USA State of Los Angeles. At this plenary session, read three reports on molecular-level manufacturing technology and molecular electronics, laser direct writing and maskless etching for achieving nanometer structures with focused ion beams. In the subsequent grouping meeting, a total of