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大面积薄膜的组分和厚度分布是实际工艺中最为关心的问题之一.利用实验和直接模拟Monte Carlo(DSMC)方法,分别研究了双电子束和三电子束物理气相沉积(EBPVD)中,钇和钛蒸气原子的三维低密度、非平衡射流,获得了它们在100和150mm单晶硅基片表面的沉积厚度和组分的分布.DSMC结果与钇和钛的蒸发速率的石英晶振探头原位测量值,沉积薄膜厚度分布的台阶仪和Rutherford背散射仪的测量数据,沉积薄膜组分分布的Rutherford背散射仪和电感耦合等离子体原子发射光谱仪测量值,均相符甚好.这表明通过DSMC方法与精细测量相结合,可在原子水平上实现EBPVD输运工艺的定量预测和设计。
The composition and thickness distribution of large area thin films are one of the most concerned issues in the practical process.Double electron beam and three electron beam physical vapor deposition (EBPVD) have been studied by using the experimental and direct simulation Monte Carlo (DSMC) Yttrium and titanium vapors, we obtain their deposition thickness and compositional distribution on the surface of 100 and 150mm monocrystalline silicon substrates.DSMC results were compared with that of yttrium and titanium The measurements of the bit measurements, the thickness profile of the deposited film, the Rutherford backscatter, the Rutherford backscatter and the inductively coupled plasma atomic emission spectrometer with the thin film component profile, all agree well with each other, Combining the method with the fine measurement, the quantitative prediction and design of the EBPVD transport process can be realized at the atomic level.