据国外媒体报道,英特尔将对外公布一项晶体管新技术,即与该公司当前标准工艺相比,采用新型超低电流的纳米工艺的晶体管电流泄漏已降低1000倍左右。英特尔最近已将晶体管长度由原先的90纳米缩短为65纳米,从而可使单一 According to foreign media reports, Intel will announce a new transistor technology that uses the new ultra-low current nano-transistor current leakage has been reduced by about 1000 times compared with the company’s current standard process. Intel has recently shortened the transistor length from 90 nm to 65 nm, enabling a single